Title:
DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/108560
Kind Code:
A1
Abstract:
In a drive method for a spatial light modulator: mirror elements arranged at a first pitch not resolved by a projection optical system in the X direction are set to phase 0, and other mirror elements are set to phase π, inside a first boundary region from among the first boundary region and a second boundary region arranged adjacent in the Y direction and extending in the X direction; and mirror elements arranged at a second pitch not resolved by the projection optical system in the X direction are set to phase π and other mirror elements are set to phase 0, inside the second boundary region. When projecting a pattern on an object using the spatial light modulator, a pattern can be formed that has finer position precision or shape precision than the width of the image formed by each optical element in the spatial light modulator.
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Inventors:
OWA SOICHI (JP)
WATANABE YOJI (JP)
WATANABE YOJI (JP)
Application Number:
PCT/JP2012/083753
Publication Date:
July 25, 2013
Filing Date:
December 26, 2012
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
H01L21/027; G02B26/08; G03F7/20
Domestic Patent References:
| WO2002041196A1 | 2002-05-23 | |||
| WO2012043497A1 | 2012-04-05 | |||
| WO2009060745A1 | 2009-05-14 |
Foreign References:
| JP2005536875A | 2005-12-02 | |||
| JP2006128194A | 2006-05-18 | |||
| US6312134B1 | 2001-11-06 | |||
| US20070242247A1 | 2007-10-18 | |||
| US5312513A | 1994-05-17 | |||
| US6885493B2 | 2005-04-26 |
Other References:
YIJIAN CHEN ET AL.: "Design and fabrication of tilting and piston micromirrors for maskless lithography", PROC. OFSPIE (USA, vol. 5751, 2005, pages 1023 - 1037
See also references of EP 2806451A4
See also references of EP 2806451A4
Attorney, Agent or Firm:
OMORI SATOSHI (JP)
Omori 聡 (JP)
Omori 聡 (JP)
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Claims: