ELASTIC WAVE DEVICE AND MANUFACTURING METHOD FOR SAME

Title:

ELASTIC WAVE DEVICE AND MANUFACTURING METHOD FOR SAME

Document Type and Number:

WIPO Patent Application WO/2013/141168

Kind Code:

A1

Abstract:

Provided is an elastic wave device that is capable of higher sound velocity, and is also resistant to an effect of a response by another mode that is spurious. The elastic wave device (1) comprises a lithium niobate film (5) and uses an SH-type surface wave. Said elastic wave device (1) is provided with: a support substrate (2); a high sound velocity film (3) formed on the support substrate (2); a low sound velocity film (4) layered on the high sound velocity film (3); the lithium niobate film (5), which is layered on the low sound velocity film (4); and an IDT electrode (6) formed on one surface of the lithium niobate film (5). The sound velocity of a bulk wave propagated in said high sound velocity film (3) is higher than the sound velocity of an elastic wave propagated in the lithium niobate film (5). The sound velocity of a bulk wave propagated in said low sound velocity film (4) is lower than the sound velocity of a bulk wave propagated in the lithium niobate film (5). In said elastic wave device (1), θ is in the range 0°-8° and 57°-180° when the Euler angles of the lithium niobate film (5) are (0° ± 5°, θ, 0°).

Inventors:

KANDO HAJIME (JP)

Application Number:

PCT/JP2013/057488

Publication Date:

September 26, 2013

Filing Date:

March 15, 2013

Export Citation:

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Assignee:

MURATA MANUFACTURING CO (JP)

International Classes:

H03H3/08; H03H9/145; H03H9/25

Domestic Patent References:

WO2011037145A1

2011-03-31

Foreign References:

JP2005210294A	2005-08-04
JP2006093971A	2006-04-06
JP2011120062A	2011-06-16
JPH11191721A	1999-07-13
JP2004343359A	2004-12-02
JP2010045752A	2010-02-25
JP2004282232A	2004-10-07
JP2002534886A	2002-10-15

Other References: