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Title:
ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/064507
Kind Code:
A1
Abstract:
An electron beam apparatus comprises: an optical device (184) that can supply a plurality of light beams; a condensing member (187) that condenses the plurality of light beams from a plurality of locations of the optical device to a first location of a photoelectric element; and an electron beam optical system (70) that makes electrons emitted from the photoelectric element (54) into a plurality of electron beams and uses these to bombard a target, wherein the intensity of the light beam with which the first location is irradiated is variable.

Inventors:
SATO SHINJI (JP)
SHIBAZAKI YUICHI (JP)
Application Number:
PCT/JP2017/035533
Publication Date:
April 04, 2019
Filing Date:
September 29, 2017
Export Citation:
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Assignee:
NIKON CORP (JP)
International Classes:
H01L21/027; G03F7/20
Foreign References:
JPH10172879A1998-06-26
JP2010537414A2010-12-02
JP2005340847A2005-12-08
JPH06291025A1994-10-18
JPH07254539A1995-10-03
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
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