Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/064508
Kind Code:
A1
Abstract:
An electron beam apparatus comprises: an optical device (184) that can supply a plurality of optical beams; a condensing member (187) that is positioned such that the plurality of optical beams from a plurality of locations of the optical device (184) are condensed to a first location of a photoelectric element (54); and an electron optical system that makes electrons emitted from the photoelectric element into an electron beam and uses this to bombard a target.

Inventors:
SATO SHINJI (JP)
SHIBAZAKI YUICHI (JP)
Application Number:
PCT/JP2017/035536
Publication Date:
April 04, 2019
Filing Date:
September 29, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORP (JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
WO2006123447A12006-11-23
Foreign References:
JPS57172729A1982-10-23
JP2005347572A2005-12-15
JP2003506828A2003-02-18
JP2006504134A2006-02-02
JP2005533365A2005-11-04
JPS61129826A1986-06-17
JPH02224322A1990-09-06
JPS60246631A1985-12-06
JPS6066816A1985-04-17
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Next Patent: DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE