Title:
ELECTRON BEAM EXPOSURE SYSTEM, IRRADIATING POSITION DETECTING METHOD, AND ELECTRON DETECTOR
Document Type and Number:
WIPO Patent Application WO/2002/047131
Kind Code:
A1
Abstract:
An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, a mark part being irradiated with an electron beam in order to detect the irradiating position of an electron beam, and a section for detecting electrons radiated from the mark part and outputting a detection signal based on a detected quantity of electrons.
Inventors:
HARAGUCHI TAKESHI (JP)
YASUDA HIROSHI (JP)
HAMAGUCHI SHINICHI (JP)
YASUDA HIROSHI (JP)
HAMAGUCHI SHINICHI (JP)
Application Number:
PCT/JP2001/010366
Publication Date:
June 13, 2002
Filing Date:
November 28, 2001
Export Citation:
Assignee:
ADVANTEST CORP (JP)
HARAGUCHI TAKESHI (JP)
YASUDA HIROSHI (JP)
HAMAGUCHI SHINICHI (JP)
HARAGUCHI TAKESHI (JP)
YASUDA HIROSHI (JP)
HAMAGUCHI SHINICHI (JP)
International Classes:
G03F7/20; G03F9/00; H01J37/244; H01J37/304; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G01B15/00; G03F7/20
Foreign References:
| JPH1064799A | 1998-03-06 | |||
| JPS63269523A | 1988-11-07 | |||
| JPS6142129A | 1986-02-28 | |||
| JPH08191042A | 1996-07-23 |
Attorney, Agent or Firm:
Ryuka, Akihiro (Shinjuku 1-chome Shinjuku-ku, Tokyo, JP)
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