Title:
OBSERVATION DEVICE AND ITS MANUFACTURING METHOD, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING MICRO DEVICE
Document Type and Number:
WIPO Patent Application WO/2002/047130
Kind Code:
A1
Abstract:
A method for manufacturing an observation device by which the residual aberration including a high-order aberration component of the wave front aberration can be corrected satisfactorily. A method for manufacturing an observation device for observing the image of the surface (WH) to be observed formed through an image-forming a focusing optical system (7, 6, 10, 11, 12 (14)). The method comprises an aberration measuring step of measuring the residual aberration left in the image-forming optical system, and a positioning step of disposing a correction plate (17) at least one of the surfaces of which is aspheric in a predetermined position in the optical path of the image-forming optical system.
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Inventors:
NAGAYAMA TADASHI (JP)
Application Number:
PCT/JP2001/010257
Publication Date:
June 13, 2002
Filing Date:
November 22, 2001
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
NAGAYAMA TADASHI (JP)
NAGAYAMA TADASHI (JP)
International Classes:
G01M11/02; G02B21/00; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G01B11/24; G01M11/00; G02B7/02; G02B13/24; G03F7/20
Foreign References:
| JPH07151963A | 1995-06-16 | |||
| JP2000235725A | 2000-08-29 | |||
| JP2000214047A | 2000-08-04 | |||
| JPH05296879A | 1993-11-12 | |||
| JP2000021752A | 2000-01-21 | |||
| JPH11125512A | 1999-05-11 | |||
| JPS6319612A | 1988-01-27 |
Other References:
See also references of EP 1349201A4
Attorney, Agent or Firm:
Yamaguchi, Takao (10 Kanda-tsukasacho 2-chom, Chiyoda-ku Tokyo, JP)
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