Title:
ELECTRON PENCIL BEAM-BASED MAGNETIC ADJUSTMENT ELECTRON RAY TREATMENT APPARATUS AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/128517
Kind Code:
A1
Abstract:
The present invention relates to an electron ray treatment apparatus and system. The apparatus comprises: an electron ray output part for generating, accelerating and outputting an electron ray; a catheter part having one end connected to the electron ray output part, and receiving the electron ray, which is output from the electron ray output part, and passing the electron ray through a hollow tunnel of a catheter; a magnetic field generation part for generating a magnetic field for refracting the electron ray passing through the hollow tunnel of the catheter; and a joint driving part enabling the electron ray output part, catheter, and magnetic field generation part to move organically and freely, wherein the catheter part may adjust the movement and rotation angle of the catheter in response to the control of a control part.
Inventors:
JUNG NURI HYUN (KR)
LEE JEONG WON (KR)
LEE MINSIK (KR)
LEE JEONG WON (KR)
LEE MINSIK (KR)
Application Number:
PCT/KR2022/021307
Publication Date:
July 06, 2023
Filing Date:
December 26, 2022
Export Citation:
Assignee:
RADEXEL INC (KR)
International Classes:
A61N5/10
Foreign References:
| JPH05154210A | 1993-06-22 | |||
| KR20130056624A | 2013-05-30 | |||
| KR20210131903A | 2021-11-03 | |||
| KR20130030668A | 2013-03-27 | |||
| JPH09134796A | 1997-05-20 |
Attorney, Agent or Firm:
BLT PATENT & LAW FIRM (KR)
Download PDF: