Title:
ELECTROSTATIC CHUCK DEVICE AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/044843
Kind Code:
A1
Abstract:
Provided is an electrostatic chuck device (1) which includes: an electrostatic chuck part (2) that has a base (11) having a mounting surface (11a) on which a plate-like sample W is mounted and an electrostatic chucking inner electrode (13) that electrostatically chucks the plate-like sample (W) to the mounting surface (11a); a cooling base part (3) that cools the electrostatic chuck part (2); and an adhesive layer (4) that is interposed between the electrostatic chuck part (2) and the cooling base part (3). The mounting surface of the base (11) is a concave surface (23) or a convex surface which is a curved surface that gradually curves toward an outer periphery (11c) of the mounting surface (11a) from the center (11b) of the mounting surface (11a), and does not include an inflection point. The absolute value of the difference between the height of the center of the concave surface (23) or the convex surface from the position of one main surface (3a) of the cooling base part (3) and the height of the outer periphery of the concave surface (23) or the convex surface from the position of the one main surface (3a) of the cooling base part (3) is 1 to 30 μm.
Inventors:
OZAKI MASAKI (JP)
MORISHITA NORITO (JP)
MORISHITA NORITO (JP)
Application Number:
PCT/JP2019/028388
Publication Date:
March 05, 2020
Filing Date:
July 19, 2019
Export Citation:
Assignee:
SUMITOMO OSAKA CEMENT CO LTD (JP)
International Classes:
H01L21/683; H02N13/00
Foreign References:
| JP6119430B2 | 2017-04-26 | |||
| JP2010171429A | 2010-08-05 | |||
| JP2006005095A | 2006-01-05 | |||
| JP2018064055A | 2018-04-19 | |||
| JP2002026113A | 2002-01-25 | |||
| JP2000113850A | 2000-04-21 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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