ELECTROSTATIC CHUCK DEVICE

WIPO Patent Application WO/2016/052291

A1

The present invention provides an electrostatic chuck device which is capable of increasing the electrostatic attraction force acting on a focus ring, and which is capable of uniformly cooling the focus ring. In this electrostatic chuck device (10), a placement platform (11) is provided with a holding part (15) which is provided to the periphery of a placement surface (24a) and along the circumferential direction of a focus ring (12), and which electrostatically attracts the focus ring (12). The holding part (15) is provided with: a pair of ridge parts (16) which are provided along the circumferential direction, and on which the focus ring (12) is placed; and an annular groove (17) formed between the pair of ridge parts (16). Either protrusions (18) are provided to the bottom surface (17a) of the groove (17), or a microprotrusion section including a plurality of microprotrusions is formed on the focus-ring (12) facing surface of at least the ridge part (16A) positioned at the outer peripheral side of the focus ring (12), among the pair of ridge parts (16). The pair of ridge parts (16) or the plurality of microprotrusions come into contact with the focus ring (12), and cooperate with the protrusions (18) to electrostatically attract the focus ring (12), without the protrusions (18) coming into contact with the focus ring.

KOUNO HITOSHI (JP)
TAKAHASHI KENTARO (JP)
GOBOU FUMIHIRO (JP)

PCT/JP2015/076890

April 07, 2016

September 24, 2015

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SUMITOMO OSAKA CEMENT CO LTD (JP)

H01L21/683; H01L21/3065; H02N13/00; B23Q3/15

JP4547182B2	2010-09-22
JPH0439645B2	1992-06-30
JP2012134375A	2012-07-12
JP5063797B2	2012-10-31
JP4417197B2	2010-02-17

SHIGA Masatake et al. (JP)
Masatake Shiga (JP)

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