Title:
ETCHANT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/055915
Kind Code:
A2
Abstract:
The present invention relates to an etchant composition for etching a triple film constituted by an indium-based metal film, an aluminum-based metal film, and a titanium-based or molybdenum-based metal film, wherein the etchant composition comprises: 0.1 wt % to 10 wt % of a ferrous compound; 0.1 wt % to 10 wt % of nitric acid; 0.01 wt % to 5 wt % of a fluorine compound; with the remainder being water, and further comprises 0.1 wt % to 5 wt % of a phosphate compound.
Inventors:
SHIN HYE-RA (KR)
YU IN-HO (KR)
KWON O-BYOUNG (KR)
LEE YU-JIN (KR)
YU IN-HO (KR)
KWON O-BYOUNG (KR)
LEE YU-JIN (KR)
Application Number:
PCT/KR2010/006956
Publication Date:
May 12, 2011
Filing Date:
October 12, 2010
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
SHIN HYE-RA (KR)
YU IN-HO (KR)
KWON O-BYOUNG (KR)
LEE YU-JIN (KR)
SHIN HYE-RA (KR)
YU IN-HO (KR)
KWON O-BYOUNG (KR)
LEE YU-JIN (KR)
International Classes:
C09K13/08; C23F1/20; C23F1/30
Foreign References:
| KR20050034952A | 2005-04-15 | |||
| KR20080045854A | 2008-05-26 | |||
| KR20080109373A | 2008-12-17 | |||
| KR20080045403A | 2008-05-23 | |||
| KR20070060864A | 2007-06-13 |
Attorney, Agent or Firm:
HAN YANG PATENT FIRM (KR)
한양특허법인 (KR)
한양특허법인 (KR)
Download PDF: