Title:
ETCHING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2016/084871
Kind Code:
A1
Abstract:
(Problem) To provide an etching system in which a pressurization filtering device is efficiently used in a circulation line, it being possible for the etching system to purify an etchant while minimizing cost. (Solution) The etching system is provided with an etching device, a circulation line, a membrane-type filtering device, and a pressurization filtering device. The etching device is provided with at least an etchant tank, and is configured to perform etching by causing the etchant contained in the etchant tank to come into contact with a glass substrate. The circulation line is configured to draw out the etchant within the etchant tank, filter the etchant, and return the etchant to the etchant tank. The membrane-type filtering device is arranged on the circulation line and is provided with an immersion membrane for filtering the introduced etchant. The pressurization filtering device is arranged on the trailing section of the membrane-type filtering device along the circulation line, and is configured to receive a slurry trapped by the immersion membrane and perform solid-liquid separation.
Inventors:
MIYOSHI YUUZOU (JP)
YAMAZAKI GINPEI (JP)
ISHIGAKI MASAKI (JP)
SHIMADA KAZUYA (JP)
IEDA TOSHIYUKI (JP)
NISHIKAWA HARUKA (JP)
YAMAZAKI GINPEI (JP)
ISHIGAKI MASAKI (JP)
SHIMADA KAZUYA (JP)
IEDA TOSHIYUKI (JP)
NISHIKAWA HARUKA (JP)
Application Number:
PCT/JP2015/083143
Publication Date:
June 02, 2016
Filing Date:
November 26, 2015
Export Citation:
Assignee:
NSC CO LTD (JP)
PANASONIC CORP (JP)
PANASONIC CORP (JP)
International Classes:
H01L21/306; B08B3/08; B08B3/14; G02F1/1333
Domestic Patent References:
| WO2014181552A1 | 2014-11-13 |
Foreign References:
| JP2008127585A | 2008-06-05 | |||
| JP2005342574A | 2005-12-15 |
Download PDF:
Previous Patent: COMPOUND HAVING ACYLAMINOPHENYL GROUP, AND USE THEREOF
Next Patent: CHARGED PARTICLE BEAM APPARATUS
Next Patent: CHARGED PARTICLE BEAM APPARATUS