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Title:
EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2012/063631
Kind Code:
A1
Abstract:
Provided is an exposure apparatus (1), wherein a first mark forming section (17) is provided in the upstream of the irradiation region of exposure light in the transfer direction of a member to be exposed (2), and a meandering detection mark (2b) is detected. A detecting section (14) detects the meandering detection mark (2b) in the direction intersecting the moving direction of the member to be exposed (2), moves an alignment mark forming section (13) so as to cancel the meandering quantity of the member to be exposed (2), said meandering quantity having been calculated on the basis of the detection, and the alignment mark (2a) is linearly formed relatively to the member to be exposed (2). Consequently, even in the case where the member to be exposed is continuously supplied, the position of a mask with respect to the member to be exposed can be accurately adjusted by changing, corresponding to meandering of the member to be exposed, the alignment mark for mask position adjustment, and highly accurate and stable exposure can be performed.

Inventors:
KANAO MASAYASU (JP)
Application Number:
PCT/JP2011/074454
Publication Date:
May 18, 2012
Filing Date:
October 24, 2011
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD (JP)
KANAO MASAYASU (JP)
International Classes:
G03F9/00; G02F1/13; G03F7/20
Foreign References:
JP2009276522A2009-11-26
JP2009053383A2009-03-12
JP2007310209A2007-11-29
JP2005316411A2005-11-10
JP2001060008A2001-03-06
JPH01295261A1989-11-28
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
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