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Patent Searching and Data


Title:
FILM EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2012/063632
Kind Code:
A1
Abstract:
A side portion coating film (22) is formed on at least one of the side edge portions in the width direction of a film (2) by applying a colored firing material, a colored photocurable material or a colored ink thereto, said film (2) being provided with an exposure material film (21) in a region for exposure pattern formation on a film base (20). An alignment mark (2a) is formed by irradiation of laser light by means of an alignment mark-forming section (14). Meandering of the film is detected using the alignment mark (2a), and the position of a mask (12) is adjusted accordingly. Consequently, when a film wherein an exposure material film is formed in a region for exposure pattern formation on a film base is continuously exposed, formation of an alignment mark and detection of a formed alignment mark can be carried out easily. Meandering of the film can therefore be accurately corrected, so that the film can be stably exposed.

Inventors:
ARAI TOSHINARI (JP)
HASHIMOTO KAZUSHIGE (JP)
Application Number:
PCT/JP2011/074455
Publication Date:
May 18, 2012
Filing Date:
October 24, 2011
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD (JP)
ARAI TOSHINARI (JP)
HASHIMOTO KAZUSHIGE (JP)
International Classes:
G03F9/00; G03F7/20
Foreign References:
JP2007310209A2007-11-29
JPH01295261A1989-11-28
JP2006235533A2006-09-07
JP2005316411A2005-11-10
JP2004523101A2004-07-29
JP2001060008A2001-03-06
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
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Claims: