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Title:
EXPOSURE DEVICE AND MICROLENS ARRAY STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2012/117802
Kind Code:
A1
Abstract:
An exposure device according to the present invention transmits exposure light from a light source through a mask wherein a plurality of patterns to be exposed are provided at a given distance in a direction orthogonal to a scanning direction, and provides an upright equal-size image of the patterns on a substrate by means of a plurality of microlenses in a microlens array. The mircolens array is constituted by microlens array chips which are connected in a second direction, and openings for transmitting the exposure light are provided in a frame shaped holder for supporting the microlens array chips, such that the openings are positioned to match the positions between the microlens array chips. Hereby, it is possible to expose a substrate on which a positive resist material is formed across regions that will become a plurality of individual substrates.

Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2012/052379
Publication Date:
September 07, 2012
Filing Date:
February 02, 2012
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD (JP)
MIZUMURA MICHINOBU (JP)
International Classes:
G03F7/20; G02B13/26; H01L21/027
Foreign References:
JP2009204982A2009-09-10
JP2007281317A2007-10-25
JP2000058422A2000-02-25
JPH09244255A1997-09-19
JPH09244254A1997-09-19
JPH0855783A1996-02-27
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
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