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Patent Searching and Data


Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/117801
Kind Code:
A1
Abstract:
An exposure device is provided with a micro-lens array wherein a plurality of micro-lenses are laid out in a prescribed regular manner. Exposure light from a light source passes through a mask, is incident upon the micro-lenses, and forms a right-side-up life-sized image on a substrate. The light source successively exposes the substrate by emitting pulses of laser light when the substrate reaches prescribed positions. Each time the entire target region of the substrate has been exposed, the micro-lens array or the mask is moved relative to the other in the column direction by an amount equal to the row pitch of the micro-lenses and the next exposure is performed. This allows high-precision, high-resolution exposure with a short takt time.

Inventors:
KAJIYAMA KOICHI (JP)
MIZUMURA MICHINOBU (JP)
HATANAKA MAKOTO (JP)
Application Number:
PCT/JP2012/052376
Publication Date:
September 07, 2012
Filing Date:
February 02, 2012
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD (JP)
KAJIYAMA KOICHI (JP)
MIZUMURA MICHINOBU (JP)
HATANAKA MAKOTO (JP)
International Classes:
G03F7/20; G02B13/26; H01L21/027
Foreign References:
JP2009204982A2009-09-10
JP2006148123A2006-06-08
JP2004335864A2004-11-25
JP2000058422A2000-02-25
JPH09244255A1997-09-19
JPH0855783A1996-02-27
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
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Claims: