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Patent Searching and Data


Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/020351
Kind Code:
A1
Abstract:
Disclosed is an exposure device, comprising: a light irradiation system (10) for sending out lights (L); a light optimizing system (20) for receiving the lights (L) and homogenizing the lights (L); a light converging system (30) for receiving the homogenized lights (L) and converging the homogenized lights (L); micro-displacement adjustment systems (40) for carrying out micro-displacement adjustment to the edge area of the light converging system (30), so as to adjust the light paths of the lights (L) reaching the edge area of the light converging system (30); and a light reflecting system (50) for receiving the converged lights (L) and reflecting the converged lights (L) to an exposure surface (60). The exposure device uses the micro-displacement adjustment systems (40) arranged at each corner of the light converging system (30) and in the middle of each edge of the light converging system (30) to carry out micro-displacement adjustment to the corners and edges of the light converging system (30), so that the light paths of the lights (L) in the edge area of the light converging system (30) are adjusted, and part of the light paths reaching the exposure surface (60) are optimized.

Inventors:
ZHANG PENGFEI (CN)
Application Number:
PCT/CN2015/087631
Publication Date:
February 09, 2017
Filing Date:
August 20, 2015
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G03F7/20; G02B7/185
Foreign References:
CN1743960A2006-03-08
TW552430B2003-09-11
CN203217248U2013-09-25
CN104749764A2015-07-01
US20020089734A12002-07-11
US20060232866A12006-10-19
Attorney, Agent or Firm:
MING & YUE INTELLECTUAL PROPERTY LAW FIRM (CN)
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