Title:
EXPOSURE MASKS
Document Type and Number:
WIPO Patent Application WO2001037042
Kind Code:
A3
Abstract:
Printing, marking or etching a surface is achieved using a mask or masks in combination with electromagnetic radiation (such as a laser or the like) or otherwise exposing one or more selected areas of a surface for treatment, utilising transmissive, non-transmissive or modified transmissivity portions of one or more layers of material of the mask. In one embodiment a surface of a first radiation transmissive layer of the mask is partially covered by a second layer of material which is substantially non-transmissive to radiation. An uncovered portion of the transmissive layer is in the shape of an element (such as a character, symbol or shape) to be printed, marked, etched or the like on the surface.
Inventors:
LAU SIMON (GB)
Application Number:
PCT/GB2000/004386
Publication Date:
May 10, 2002
Filing Date:
November 17, 2000
Export Citation:
Assignee:
LASERS ARE US LTD (GB)
LAU SIMON (GB)
LAU SIMON (GB)
International Classes:
G03F1/00; (IPC1-7): G03F1/14; B41B17/00
Foreign References:
| DE2443693A1 | 1976-03-25 |
Other References:
JOHN STURGE ED.: "Imaging Processes and Materials", 1989, VAN NOSTRAND REINHOLD, NEW YORK, USA, XP002169384, 16721
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