Title:
EXPOSURE METHOD AND SCANNING-TYPE ALIGNER
Document Type and Number:
WIPO Patent Application WO/1999/035537
Kind Code:
A1
Abstract:
An exposure method and a scanning-type aligner which are used in a photolithography method for the manufacture of liquid crystal display device, etc., particularly, an exposure method and a scanning-type aligner which are suitable for the exposure of a substrate deformed in the manufacturing process and, more particularly, an exposure method and a scanning-type aligner which enable the precise alignment of the deformed substrate. A scanning-type aligner by which a mask (5) having a pattern and a plate (4) are synchronously transferred and the pattern of the mask (5) is exposed onto the plate (4) has alignment microscopes (1 and 2) which detect the deformation of the shape of the plate (4) and a controller (13) which corrects the relative position between the mask (5) and the plate (4) during the transfer in accordance with the detection result.
Inventors:
NARA KEI (JP)
KATO HIROKAZU (JP)
KATO HIROKAZU (JP)
Application Number:
PCT/JP1998/005854
Publication Date:
July 15, 1999
Filing Date:
December 24, 1998
Export Citation:
Assignee:
NIKON CORP (JP)
NARA KEI (JP)
KATO HIROKAZU (JP)
NARA KEI (JP)
KATO HIROKAZU (JP)
International Classes:
G03F7/20; G03F7/207; G03F9/00; (IPC1-7): G03F7/20; H01L21/027
Foreign References:
| JPH0774079A | 1995-03-17 | |||
| JPH07273000A | 1995-10-20 | |||
| JPS6459813A | 1989-03-07 | |||
| JPH09199386A | 1997-07-31 | |||
| JPH02272719A | 1990-11-07 | |||
| JPH08227854A | 1996-09-03 |
Attorney, Agent or Firm:
Morioka, Masaki (Ogikubo 5-chome Suginami-ku Tokyo, JP)
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