Title:
EXPOSURE PARAMETER ADJUSTMENT METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/109620
Kind Code:
A1
Abstract:
An exposure parameter adjustment method and apparatus. The method is applied to an image acquisition apparatus. The method comprises: after a first image is acquired, acquiring black-and-white pixels and color pixels in the first image; selecting, as a calculated brightness according to an ambient light intensity, a brightness from a first brightness, a second brightness, and a third brightness, the first brightness being acquired by performing calculation on the brightness of the black-and-white pixels, the second brightness being acquired by performing calculation on the brightness of the color pixels, and the magnitude of the third brightness being between the first brightness and the second brightness; and then adjusting an exposure parameter of an image acquisition apparatus according to the calculated brightness. When the ambient light intensity changes, the exposure parameter of the image acquisition apparatus is adjusted according to the calculated brightness selected according to the ambient light intensity, such that exposure of a subsequently acquired image is close to optimal exposure, thereby improving imaging quality, and allowing an image sensor to operate adaptively in environments corresponding to various ambient light intensities.
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Inventors:
CHENG MIN (CN)
TANG NA (CN)
TANG NA (CN)
Application Number:
PCT/CN2020/110075
Publication Date:
June 10, 2021
Filing Date:
August 19, 2020
Export Citation:
Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
H04N9/04; H04N5/235
Domestic Patent References:
| WO2018004238A1 | 2018-01-04 |
Foreign References:
| CN111064899A | 2020-04-24 | |||
| CN104581100A | 2015-04-29 | |||
| CN105827990A | 2016-08-03 | |||
| CN110401787A | 2019-11-01 |
Attorney, Agent or Firm:
TDIP & PARTNERS (CN)
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