Title:
EXPOSURE SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2020/189729
Kind Code:
A1
Abstract:
[Problem] To determine whether a photosensitive protecting group has been fully removed after a lyophilic/phobic pattern has been formed by exposing a layer of a compound that includes the protecting group to light but before a wiring pattern is formed. [Solution] An exposure system that exposes a layer that is on a substrate and includes a photosensitive protecting group to light and forms a lyophilic/phobic pattern that includes a lyophilic region and a lyphobic region on the layer. The exposure system comprises an exposure device that exposes the layer to light, a detection device that contactlessly detects regions that have been exposed to light by the exposure device, and a control device that controls at least one of the devices included in the exposure system on the basis of detection results from the detection device.
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Inventors:
KAWAKAMI YUSUKE (JP)
FUKAWA YASUTERU (JP)
FUKAWA YASUTERU (JP)
Application Number:
PCT/JP2020/012066
Publication Date:
September 24, 2020
Filing Date:
March 18, 2020
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20
Domestic Patent References:
| WO2018225549A1 | 2018-12-13 | |||
| WO2017057427A1 | 2017-04-06 | |||
| WO2018008610A1 | 2018-01-11 |
Foreign References:
| JP2017090517A | 2017-05-25 | |||
| JP2017166003A | 2017-09-21 | |||
| JP2012174984A | 2012-09-10 |
Attorney, Agent or Firm:
NISHI, Kazuya (JP)
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