Title:
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/186754
Kind Code:
A1
Abstract:
An extreme ultraviolet light generation system (11) comprises: a chamber (2); a target supply unit (26) for outputting a plurality of droplets (27a) sequentially toward a given region in the chamber, the droplets including a first droplet and a second droplet that contain a target substance; an orbit correction laser device (35) using orbit correction laser light (36) to irradiate each of a plurality of droplets which moves from the target supply unit toward the given region; a drive laser device (3) for generating plasma from each droplet by irradiating a droplet that arrives at the given region with drive laser light (33a); and a control unit (5) for controlling the orbit correction laser device so that the light intensity changes between the orbit correction laser light for irradiating the first droplet and the orbit correction laser light for irradiating the second droplet.
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Inventors:
YANAGIDA TATSUYA (JP)
Application Number:
PCT/JP2018/012731
Publication Date:
October 03, 2019
Filing Date:
March 28, 2018
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G21K5/02; G03F7/20; H05G2/00
Foreign References:
| US20170311429A1 | 2017-10-26 | |||
| JP2012169241A | 2012-09-06 | |||
| JP2016509343A | 2016-03-24 | |||
| JP2015520513A | 2015-07-16 | |||
| JP2016538703A | 2016-12-08 |
Attorney, Agent or Firm:
HOSAKA Nobuhisa (JP)
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