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Title:
EXTRUSION DEVICE, PHOTORESIST SUPPLY SYSTEM AND PHOTORESIST SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2021/227909
Kind Code:
A1
Abstract:
An extrusion device (10), a photoresist supply system and a photoresist supply method. The extrusion device (10) comprises: a base (100), with the base (100) being used for bearing and placing a photoresist bottle; a supporting rail (101), with the supporting rail (101) being vertically arranged on the base (100); an extrusion structure (102), with an end part of the extrusion structure (102) being movably arranged on the supporting rail (101), such that the extrusion structure (102) moves up and down along the rail direction of the supporting rail (101); and a driving module (103), with the driving module (103) being used for driving the extrusion structure (102), such that the extrusion structure (102) deforms so as to reduce the area of a region enclosed by the extrusion structure (102), and the driving module being further used for driving the deformed extrusion structure (102), such that the extrusion structure (102) moves up and down in a rail direction of the supporting rail (101). The photoresist bottle is extruded by means of the extrusion device (10), such that the utilization rate of the photoresist in the photoresist bottle is improved.

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Inventors:
LI SHENGJIAO (CN)
TUNG CHIA JEN (CN)
Application Number:
PCT/CN2021/091799
Publication Date:
November 18, 2021
Filing Date:
May 02, 2021
Export Citation:
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Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F7/16
Foreign References:
CN209486466U2019-10-11
CN205429012U2016-08-03
CN105346815A2016-02-24
CN110586415A2019-12-20
CN103645606A2014-03-19
CN202423237U2012-09-05
US20060137419A12006-06-29
Attorney, Agent or Firm:
SHANGHAI CHENHAO INTELLECTUAL PROPERTY LAW FIRM GENERAL PARTNERSHIP (CN)
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