Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PHOTOMASK AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/227910
Kind Code:
A1
Abstract:
A photomask and a manufacturing method therefor. The photomask comprises: a substrate (11), and a light-shielding layer (12) and a barrier layer (13) which are located on the substrate (11), wherein the light-shielding layer (12) is internally provided with an opening (121) that exposes the surface of the substrate (11); the barrier layer (13) covers a side wall of the opening (121); and the bottom of the barrier layer (13) is in contact with the substrate (11).

More Like This:
JP5401994The photomask which has a RFID tag and a RFID tag
JPH06250377EXPOSURE METHOD AND PHOTOMASK USED IN THE SAME
JPS6197828METHOD FOR DETECTING POSITION OF MATERIAL BY ION BEAM
Inventors:
KONG ZHINENG (CN)
ZHANG XIUXUAN (CN)
Application Number:
PCT/CN2021/091800
Publication Date:
November 18, 2021
Filing Date:
May 02, 2021
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/38
Foreign References:
JP2019215467A2019-12-19
CN101046626A2007-10-03
CN201611423U2010-10-20
CN103955110A2014-07-30
CN105575774A2016-05-11
JPH08227141A1996-09-03
Attorney, Agent or Firm:
SHANGHAI CHENHAO INTELLECTUAL PROPERTY LAW FIRM GENERAL PARTNERSHIP (CN)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: EXTRUSION DEVICE, PHOTORESIST SUPPLY SYSTEM AND PHOTORESIST SUPPLY METHOD

Next Patent: RELEASE MECHANISM AND METHOD FOR DEEPWATER VISUAL AND CONTROLLABLE LIGHT-SEDIMENT COLUMNAR SAMPLING ...