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Patent Searching and Data


Title:
FACIAL MASK FITTING FACIAL CONTOUR
Document Type and Number:
WIPO Patent Application WO/2015/054975
Kind Code:
A1
Abstract:
A facial mask fitting facial contours, being provided with a transversely elongated chin fitting area below the vertical central axis of the planar facial mask, corresponding to the chin position of the face, the transversely elongated chin fitting area having a height of about 0.5-1.5 cm and a width of about 8-10 cm concaved toward the mouth part of the face, and is bilaterally symmetrical relative to the vertical central axis; the facial mask body in the chin fitting area can be cut out to form a chin opening, or is provided with at least one transverse incision line and/or a plurality of longitudinal or oblique incision lines thereon, such that the chin fitting area correspondingly fits U-shaped chin contours to result in a W-shaped complete fit; arc-shaped temple openings are respectively disposed at the two sides of the facial mask corresponding to the temples at both sides of the face, so as to avoid the hair growing areas at the temples when using the facial mask, and to provide extra space for spreading and extending the facial mask. Therefore, the planar facial mask fits the facial contours to avoid creases, protrusions or overlapping.

Inventors:
LIN YU-YUEH (CN)
Application Number:
PCT/CN2014/000837
Publication Date:
April 23, 2015
Filing Date:
September 10, 2014
Export Citation:
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Assignee:
LIN YU-YUEH (CN)
International Classes:
A45D44/22
Foreign References:
TWM469800U2014-01-11
CN203493022U2014-03-26
TWD123767S
CN102227181A2011-10-26
CN202179259U2012-04-04
JPH11196933A1999-07-27
Attorney, Agent or Firm:
KELONG INTERNATIONAL INTELLECTUAL PROPERTY AGENT LTD. (CN)
北京科龙寰宇知识产权代理有限责任公司 (CN)
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