Title:
FePt SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2013/105647
Kind Code:
A1
Abstract:
Provided are an FePt sputtering target with which it is possible to eliminate the use of multiple targets and use only a thin film comprising an FePt alloy that is suitable as a magnetic recording medium, and a method for producing the same. The target has a dispersed structure of an FePt alloy phase, which is formed from 40 to 60 at% of Pt, with Fe and inevitable impurities as the balance; a C phase comprising inevitable impurities; and a metal oxide phase comprising inevitable impurities. The C content of the entire target is greater than 0 vol% but 20 vol% or less; the metal oxide content of the entire target is 10 vol% or greater but less than 40 vol%; and the total content of C and metal oxide in the entire target is 20 to 40 vol%.
Inventors:
MIYASHITA TAKANOBU (JP)
GOTO YASUYUKI (JP)
YAMAMOTO TAKAMICHI (JP)
KUSHIBIKI RYOUSUKE (JP)
AONO MASAHIRO (JP)
NISHIURA MASAHIRO (JP)
GOTO YASUYUKI (JP)
YAMAMOTO TAKAMICHI (JP)
KUSHIBIKI RYOUSUKE (JP)
AONO MASAHIRO (JP)
NISHIURA MASAHIRO (JP)
Application Number:
PCT/JP2013/050429
Publication Date:
July 18, 2013
Filing Date:
January 11, 2013
Export Citation:
Assignee:
TANAKA PRECIOUS METAL IND (JP)
International Classes:
C23C14/34; B22F9/08; C22C1/05; C22C5/04; C22C32/00; G11B5/851
Domestic Patent References:
| WO2012029498A1 | 2012-03-08 | |||
| WO2012086335A1 | 2012-06-28 | |||
| WO2012086300A1 | 2012-06-28 |
Foreign References:
| JP2003313659A | 2003-11-06 | |||
| JP2011208167A | 2011-10-20 | |||
| JP2006161082A | 2006-06-22 |
Attorney, Agent or Firm:
MATSUYAMA, Keisuke et al. (JP)
Keisuke Matsuyama (JP)
Keisuke Matsuyama (JP)
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Claims: