Title:
FILM FORMATION METHOD, COMPUTER MEMORY MEDIUM, AND FILM FORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/144285
Kind Code:
A1
Abstract:
The present invention is a film formation method that forms a film of a silane coupling agent on a substrate, and wherein the method has: a supply step that supplies the silane coupling agent onto the substrate; and a film formation step that applies ultrasonic vibration to the silane coupling agent supplied onto the substrate, and forms a film of the silane coupling agent on the substrate. It is possible to appropriately forma a film of the silane coupling agent on the substrate, and it is possible to increase substrate processing throughput.
Inventors:
HIROSHIRO KOUKICHI (JP)
TERADA SHOICHI (JP)
NISHI TAKANORI (JP)
KITANO TAKAHIRO (JP)
TERADA SHOICHI (JP)
NISHI TAKANORI (JP)
KITANO TAKAHIRO (JP)
Application Number:
PCT/JP2012/057147
Publication Date:
October 26, 2012
Filing Date:
March 21, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
HIROSHIRO KOUKICHI (JP)
TERADA SHOICHI (JP)
NISHI TAKANORI (JP)
KITANO TAKAHIRO (JP)
HIROSHIRO KOUKICHI (JP)
TERADA SHOICHI (JP)
NISHI TAKANORI (JP)
KITANO TAKAHIRO (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
| JP2004311713A | 2004-11-04 | |||
| JP2010538806A | 2010-12-16 | |||
| JP2009276587A | 2009-11-26 | |||
| JPH11166157A | 1999-06-22 | |||
| JP2008174411A | 2008-07-31 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)
Tetsuo Kanamoto (JP)
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Claims: