Title:
FILM-FORMING DEVICE, FILM-FORMING METHOD, AND FILM-FORMING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/196179
Kind Code:
A1
Abstract:
This film-forming device is provided with a processing container, a support ring, a film-forming unit, and a control unit. The support ring supports the peripheral edge of a substrate disposed on the processing container. The film-forming unit has a plurality of supply ports. The film forming unit supplies a material gas from the supply ports to the reverse surface of the substrate in relation to the surface on which an element is formed, and thereby forms a film on the reverse surface of the substrate. The control unit independently controls the supplying of the material gas, and the stopping of the supplying of the material gas, from each of the supply ports.
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Inventors:
KUBO ATSUSHI (JP)
SAKAUE HIROMITSU (JP)
SHINDO TAKEHIRO (JP)
NITADORI HIROMI (JP)
ENDO ATSUSHI (JP)
SAKAUE HIROMITSU (JP)
SHINDO TAKEHIRO (JP)
NITADORI HIROMI (JP)
ENDO ATSUSHI (JP)
Application Number:
PCT/JP2020/012073
Publication Date:
October 01, 2020
Filing Date:
March 18, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/31; C23C16/455
Foreign References:
| KR20180017676A | 2018-02-21 | |||
| JP2015525302A | 2015-09-03 | |||
| JPH0936050A | 1997-02-07 | |||
| JP2004134631A | 2004-04-30 | |||
| JPH07273029A | 1995-10-20 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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