FILM-FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN

Title:

FILM-FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN

Document Type and Number:

WIPO Patent Application WO/2021/029320

Kind Code:

A1

Abstract:

This film-forming material for lithography contains a compound having a group represented by formula (0).　Said film-forming material for lithography can be applied to a wet process and is useful for forming a photoresist underlayer film having excellent etching resistance.

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WO/2004/081538	COMPOSITIONS AND METHODS OF VINYL OXAZOLONE POLYMERIZATION
JP2593993	[Title of Invention] Contact Lens Material

Inventors:

OKADA YU (JP)
HORIUCHI JUNYA (JP)
ECHIGO MASATOSHI (JP)

Application Number:

PCT/JP2020/030178

Publication Date:

February 18, 2021

Filing Date:

August 06, 2020

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Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)

International Classes:

C08F26/06; G03F7/039; G03F7/11; G03F7/20; H01L21/027

Foreign References:

JP2007051196A	2007-03-01
JP2015049419A	2015-03-16
JP2018536757A	2018-12-13

Attorney, Agent or Firm:

YAMAMOTO, Osamu et al. (JP)

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