FILM HAVING METHACRYLIC ACID ESTER-BASED RESIN AS MAIN COMPONENT THEREOF

WIPO Patent Application WO/2023/013404

A1

Provided is a resin film which is equipped with both high transparency and excellent blocking resistance. A film which contains cross-linked (meth)acrylic acid ester-based resin particles and has a methacrylic acid ester-based resin as a principal component thereof, wherein: the cross-linked (meth)acrylic acid ester-based resin particles have an average particle diameter equal to 1-10%, inclusive, of the average thickness of the film; the film does not contain a vinylidene fluoride-based resin; the haze of the film is 5% or less when measured on the basis of JIS K7136:2000; and the clarity (CLR) of the film calculated on the basis of said formula is at least 97%. CLR=100×(Ic-Ir)/(Ic+Ir); Ic represents the amount of light which travels straight forward relative to the optical axis of parallel light which is perpendicularly incident on the surface of the film, from among the light which passes through said film, and Ir represents the amount of narrow-angle scattered light for which the angle relative to the optical axis of the parallel light is within ±2.5°.

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YASUMOTO NORIAKI (JP)
MIYAMURA YASUSHI (JP)
TAKANO KEIJI (JP)

PCT/JP2022/028095

February 09, 2023

July 19, 2022

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DENKA COMPANY LTD (JP)

C08J5/18; B32B27/00; B32B27/30

WO2015137309A1	2015-09-17
WO2011142453A1	2011-11-17

JP2010275434A	2010-12-09
JP2002019051A	2002-01-22
JP2016044300A	2016-04-04
JP2012187934A	2012-10-04

AXIS PATENT INTERNATIONAL (JP)

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