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Patent Searching and Data


Title:
FILM PROCESSING UNIT, SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/082065
Kind Code:
A1
Abstract:
A film processing unit, wherein: a spin chuck holds and rotates a substrate, and a coating solution is discharged onto the substrate; any of the coating solution that spatters outward from the substrate is received and held by an outer cup; to clean the outer cup, a cleaning solution is discharged from a cup-cleaning nozzle onto the inner-peripheral surface of the outer cup through a first guide part; as a result, any of the coating solution adhered to the outer cup, a solidified product thereof, and the like are dissolved and removed from the outer cup; next, a metal-removing solution is discharged from the cup-cleaning nozzle onto the inner-peripheral surface of the outer cup through a second guide part; and as a result, a metal component remaining on the outer cup is dissolved and removed from the outer cup.

Inventors:
TANAKA YUJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
Application Number:
PCT/JP2016/081851
Publication Date:
May 18, 2017
Filing Date:
October 27, 2016
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; H01L21/027
Foreign References:
JPH05160017A1993-06-25
JP2001319910A2001-11-16
JP2009239081A2009-10-15
JP2006332185A2006-12-07
JP2013076973A2013-04-25
JPH06124887A1994-05-06
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
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