Title:
FINE PARTICLE MEASUREMENT SYSTEM CLEANING METHOD AND ULTRAPURE WATER PRODUCTION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2020/195510
Kind Code:
A1
Abstract:
With respect to a fine particle measurement system 3 in which a fine particle measurement device 17 is provided to a measurement pipe 15 through which ultrapure water (one example of treated water) flows, on the downstream side in the flowing direction of the ultrapure water relative to the fine particle measurement device 17, the fine particle measurement system 3 is cleaned by setting the flow rate of the ultrapure water as a first cleaning flow rate greater than the flow rate for measuring the number of fine particles.
Inventors:
NAGATA SHIORI (JP)
TANJI AKIRA (JP)
NOGUCHI YUKIO (JP)
TANJI AKIRA (JP)
NOGUCHI YUKIO (JP)
Application Number:
PCT/JP2020/007991
Publication Date:
October 01, 2020
Filing Date:
February 27, 2020
Export Citation:
Assignee:
NOMURA MICRO SCIENCE KK (JP)
International Classes:
G01N15/06; C02F1/00
Domestic Patent References:
| WO2015064628A1 | 2015-05-07 |
Foreign References:
| JP2017156124A | 2017-09-07 | |||
| JP2001124692A | 2001-05-11 | |||
| JPS50142087A | 1975-11-15 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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