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Title:
FLOW RATE MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/000865
Kind Code:
A1
Abstract:
A flow rate measurement device having a pair of first and second centrifugal separation chambers (25, 26) with curved wall surfaces, a first introduction channel (27) for communicating a first auxiliary channel (21a) with one end of the wall surface of the first centrifugal separation chamber (25), an intermediate channel (29) for communicating the other end of the wall surface of the first centrifugal separation chamber (25) with one end of the wall surface of the second centrifugal separation chamber (26), a second introduction channel (28) for communicating the other end of the wall surface of the second centrifugal separation chamber (26) with a second auxiliary channel (22a), a first branch channel (35) communicating with the first centrifugal separation chamber (25) at a substantially right angle to the direction of the curvature of the wall surface of the first centrifugal separation chamber (25), a second branch channel (36) communicating with the first centrifugal separation chamber (26) at a substantially right angle to the direction of the curvature of the wall surface of the second centrifugal separation chamber (26), and a detection space section (23b) for communicating with each other the first branch channel (35) and the second branch channel (36) and having a detection element placed in the space section (23b). The flow rate measurement device can reliably separate dust from fluid.

Inventors:
UEDA NAOTSUGU (JP)
NOZOE SATOSHI (JP)
Application Number:
PCT/JP2006/310560
Publication Date:
January 04, 2007
Filing Date:
May 26, 2006
Export Citation:
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Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
UEDA NAOTSUGU (JP)
NOZOE SATOSHI (JP)
International Classes:
G01F1/00; G01F1/684
Foreign References:
JP2002506528A2002-02-26
JP2003531366A2003-10-21
JP2002005712A2002-01-09
JPH11166720A1999-06-22
JPH11166720A1999-06-22
Other References:
See also references of EP 1901042A4
Attorney, Agent or Firm:
KAWAMIYA, Osamu et al. (IMP Building 3-7, Shiromi 1-chome, Chuo-k, Osaka-shi Osaka 01, JP)
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