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Title:
FLOW RATE MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/245976
Kind Code:
A1
Abstract:
The present invention addresses the problem of obtaining a flow rate measurement device that can improve fouling resistance and accurately measure a flow rate of to-be-measured gas. A flow rate measurement device (20) according to the present invention is provided with: a substrate (304) that is disposed along a flow direction of to-be-measured gas (2) in a sub-passage (134); a support body (401) that is disposed to oppose one surface (304a) of the substrate; and a flow rate sensor (411) that is supported by the support body, that opposes one surface of the substrate, and that measures a flow rate of the to-be-measured gas passing between the support body and the substrate. In addition, the sub-passage has: a first passage part D1 between the support body and the one surface of the substrate; a second passage part D2 between the other surface of the substrate and a passage wall surface of the sub-passage opposing the other surface of the substrate; and a third passage part D3 between the support body and a passage wall surface of the sub-passage opposing the support body. Further, the support body is characterized by having a first lateral surface (407) opposing the support body in the flow direction of the to-be-measured gas in the sub-passage.

Inventors:
UENODAN AKIRA (JP)
SAITO NAOKI (JP)
MIKI TAKAHIRO (JP)
GORAI NOBUAKI (JP)
Application Number:
PCT/JP2021/003178
Publication Date:
December 09, 2021
Filing Date:
January 29, 2021
Export Citation:
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Assignee:
HITACHI ASTEMO LTD (JP)
International Classes:
G01F1/684
Domestic Patent References:
WO2019049513A12019-03-14
WO2020250870A12020-12-17
Foreign References:
JP2002168669A2002-06-14
Attorney, Agent or Firm:
TODA Yuji (JP)
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