FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR MANUFACTURING DEVICE

Title:

FLOWRATE CONTROL UNIT FOR TEMPERATURE ADJUSTMENT AND SEMICONDUCTOR MANUFACTURING DEVICE

Document Type and Number:

WIPO Patent Application WO/2023/210257

Kind Code:

A1

Abstract:

According to the present invention, when the current temperature of a fluid for post-circulation temperature control is lower than a second temperature T12, the temperature of the fluid for temperature control is adjusted on the basis of a first temperature control value C11 indicating a temperature (fourth temperature T14) higher than the second temperature T12 until the current temperature rises to a prescribed threshold value (third temperature T13) lower than the second temperature T12. When the current temperature has risen to the threshold value (third temperature T13), the temperature of the fluid for temperature control is adjusted on the basis of a second temperature control value C12 indicating a temperature equal to the second temperature T12.

Inventors:

SUZUKI YUKO (JP)
NISHIKAWA KEIICHI (JP)
YOSHIDA NAOFUMI (JP)
YOSHIMURA KEISUKE (JP)
KATAGIRI TAKUYA (JP)
MURAKAMI RYO (JP)

Application Number:

PCT/JP2023/013492

Publication Date:

November 02, 2023

Filing Date:

March 31, 2023

Export Citation:

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Assignee:

CKD CORP (JP)
TOKYO ELECTRON LTD (JP)

International Classes:

H01L21/683; G05D23/19; H01L21/3065

Foreign References:

JP2013026561A	2013-02-04
JP2009117443A	2009-05-28
JP2014063972A	2014-04-10
JP2008251681A	2008-10-16
JP2020160731A	2020-10-01
JP2010117812A	2010-05-27