Title:
GAS BARRIER MULTILAYER FILM, AND METHOD FOR ENHANCING OXYGEN BARRIER PROPERTIES OF GAS BARRIER MULTILAYER FILM
Document Type and Number:
WIPO Patent Application WO/2018/088104
Kind Code:
A1
Abstract:
A gas barrier multilayer film which has a gas barrier layer on a vapor deposited surface of a metal vapor deposited film, and wherein the OD value of the metal vapor deposited film is 1.7 or more and the oxygen barrier properties of the gas barrier layer is 600 (cc/m2·day·atm) or less; and a method for enhancing the oxygen barrier properties of a gas barrier multilayer film having a gas barrier layer on a vapor deposited surface of a metal vapor deposited film, wherein the OD value of the metal vapor deposited film is set to 1.7 or more and the oxygen barrier properties of the gas barrier layer is set to 600 (cc/m2·day·atm) or less.
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Inventors:
SHIMOGUCHI MUTSUHIRO (JP)
ARAI MASAMITSU (JP)
SHIRAISHI KOUJI (JP)
HAYASHI MASANORI (JP)
ARAI MASAMITSU (JP)
SHIRAISHI KOUJI (JP)
HAYASHI MASANORI (JP)
Application Number:
PCT/JP2017/036951
Publication Date:
May 17, 2018
Filing Date:
October 12, 2017
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
B32B15/04; B32B7/02; B32B15/08; B65D65/40; B65D81/24
Domestic Patent References:
| WO2009154150A1 | 2009-12-23 |
Foreign References:
| JP2004098596A | 2004-04-02 | |||
| JP2016006140A | 2016-01-14 | |||
| JP2011143714A | 2011-07-28 | |||
| JP2011143709A | 2011-07-28 |
Attorney, Agent or Firm:
KONO Michihiro (JP)
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