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Patent Searching and Data


Title:
GAS MEASURING DEVICE AND GAS MEASURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/241907
Kind Code:
A1
Abstract:
The present invention relates to a device for measuring the flow rate or mass of a gas, and a method for measuring the flow rate or mass of the gas. The gas measuring device according to the present invention may comprise: an analyzer capable of measuring the flow rate of each of a plurality of gases; a first injector capable of injecting a reference gas into the analyzer at a constant predetermined flow rate; a second injector for injecting a to-be-analyzed gas into the analyzer; and a calculation unit for using the formula below to compensate for the flow rate, measured by the analyzer, of the to-be-analyzed gas, and derive the actual flow rate of the to-be-analyzed gas. [Actual flow rate of to-be-analyzed gas]=[Flow rate of to-be-analyzed gas measured by the analyzer]/[Flow rate of reference gas measured by the analyzer]x[Predetermined flow rate in the first injector]

Inventors:
JEONG KYUNG HWAN (KR)
Application Number:
KR2019/006254
Publication Date:
December 03, 2020
Filing Date:
May 24, 2019
Export Citation:
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Assignee:
JEONG KYUNG HWAN (KR)
International Classes:
G01F1/76; G01F25/00
Foreign References:
JP2004199245A2004-07-15
KR20100109665A2010-10-11
KR20090035573A2009-04-09
KR20050026393A2005-03-15
JP2004077327A2004-03-11
KR101997394B12019-07-05
Attorney, Agent or Firm:
SUNGAM SUH INTERNATIONAL PATENT & LAW FIRM (KR)
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