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Patent Searching and Data


Title:
GASIFIED-GAS PROCESSING EQUIPMENT AND GASIFIED-GAS PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/022169
Kind Code:
A1
Abstract:
The present invention includes: a first heat exchanger 11 for performing heat exchange between a purified gas, which is obtained by removing at least ammonia and hydrogen chloride from a gasified gas, and vapor at a saturation temperature; a second heat exchanger 12 for performing heat exchange between the gasified gas and at least a condensed liquid generated by the heat exchange; and a circulation system 13 for circulating, between the first heat exchanger 11 and the second heat exchanger 12, a circulation fluid that contains at least one of the vapor and the condensed liquid, wherein the circulation system 13 is configured so as to supply the circulation fluid that contains at least the condensed liquid generated in the first heat exchanger 11 to the second heat exchanger 12, and so as to supply the circulation fluid that contains at least the vapor generated in the second heat exchanger 12 to the first heat exchanger 11.

Inventors:
YOSHIDA KAORI (JP)
KAN RIKIO (JP)
KAKESAKO SEIJI (JP)
Application Number:
PCT/JP2019/028187
Publication Date:
January 30, 2020
Filing Date:
July 18, 2019
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND ENG LTD (JP)
International Classes:
C10K1/08
Foreign References:
JPH11294186A1999-10-26
JPH11104451A1999-04-20
JP2017129315A2017-07-27
JP2010235915A2010-10-21
JP3764568B22006-04-12
Other References:
See also references of EP 3783086A4
Attorney, Agent or Firm:
SEISHIN IP PATENT FIRM, P.C. (JP)
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