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Patent Searching and Data


Title:
GATE VALVE FOR SEMICONDUCTOR TREATMENT SYSTEM AND VACUUM CONTAINER
Document Type and Number:
WIPO Patent Application WO/2004/081996
Kind Code:
A1
Abstract:
A gate valve (20) for a semiconductor treatment system, comprising a housing (21) forming a plurality of passages (22A to 22D) arranged parallel with each other along a first direction, the passages further comprising ports (23A to 23D) facing a first specified side in a second direction orthogonal to the first direction. Valve seats (25A to 25D) are disposed on the ports at more backward positions in the second direction as the valve seats are positioned nearer the second specified side in the first direction. A plurality of valve plates (24A to 24D) opening and closing the ports are disposed parallel with each other in the second direction. The valve plates are slid by drive mechanisms (30A to 30D).

Inventors:
HIROKI TSUTOMU (JP)
Application Number:
PCT/JP2004/002431
Publication Date:
September 23, 2004
Filing Date:
February 27, 2004
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
HIROKI TSUTOMU (JP)
International Classes:
B01J3/00; B01J3/02; F16K3/02; F16K51/02; H01L21/00; H01L21/02; B65G49/00; H01L21/677; (IPC1-7): H01L21/02; H01L21/68; B01J3/00; B01J3/02; B65G49/00; F16K51/02
Foreign References:
JP2001160578A2001-06-12
JP2001324032A2001-11-22
JP2001160578A2001-06-12
JP2001324032A2001-11-22
JPH02113178A1990-04-25
Other References:
See also references of EP 1608002A4
Attorney, Agent or Firm:
Suzuye, Takehiko c/o Suzuye & Suzuye 7-2 (Kasumigaseki 3-chome Chiyoda-k, Tokyo ., JP)
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