Title:
GLASS SUBSTRATE CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2014/080917
Kind Code:
A1
Abstract:
A method for cleaning a glass substrate after polishing, wherein a decrease in adhesion performance of a resin BM film formed on the cleaned glass substrate surface is suppressed and peeling of the resin BM film is prevented. A glass substrate cleaning method, characterized in that a glass substrate polished using a polishing agent containing cerium oxide particles is washed using an acidic aqueous cleaning liquid containing an organic acid and then washed using an alkaline aqueous cleaning liquid containing a base.
Inventors:
ENOMOTO HISAO (JP)
SAHARA KOJI (JP)
ISHIKAWA CHIAKI (JP)
KIYAMA ATSUSHI (JP)
MAEYANAGI YOSHITAKA (JP)
TAKENAKA ATSUYOSHI (JP)
KOBAYASHI DAISUKE (JP)
TAKAHASHI HIDEYUKI (JP)
NAKAJIMA YOUJI (JP)
SAHARA KOJI (JP)
ISHIKAWA CHIAKI (JP)
KIYAMA ATSUSHI (JP)
MAEYANAGI YOSHITAKA (JP)
TAKENAKA ATSUYOSHI (JP)
KOBAYASHI DAISUKE (JP)
TAKAHASHI HIDEYUKI (JP)
NAKAJIMA YOUJI (JP)
Application Number:
PCT/JP2013/081203
Publication Date:
May 30, 2014
Filing Date:
November 19, 2013
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
PARKER CORP (JP)
PARKER CORP (JP)
International Classes:
C03C23/00; C11D1/44; C11D3/20; C11D3/34; C11D3/36; G02F1/1333
Foreign References:
| JP2001206737A | 2001-07-31 | |||
| JP2004059419A | 2004-02-26 | |||
| JP2001229531A | 2001-08-24 | |||
| JP2004145958A | 2004-05-20 | |||
| JP2009087523A | 2009-04-23 | |||
| JP2012219186A | 2012-11-12 | |||
| JP2011105824A | 2011-06-02 | |||
| JP2012248247A | 2012-12-13 |
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
Spring name Kenji (JP)
Download PDF: