Title:
HEATING DEVICE AND CVD APPARATUS COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2020/244357
Kind Code:
A1
Abstract:
Provided is a heating device for heating a rotatable substrate stage, the heating device being used for improving the temperature uniformity of each area of an upper surface of a substrate stage. The substrate stage has a rotation axis, the heating device is located below the substrate stage and is spaced apart from the substrate stage by a certain distance in a vertical direction. The heating device comprises one or more first heaters and a plurality of auxiliary heaters, wherein the one or more first heaters are used for heating an annular area of the substrate stage above same; and the plurality of auxiliary heaters are located below the annular area, the distances between each of the plurality of auxiliary heaters and the rotation axis are different so as to adjust the temperature of a local area of the annular area.
Inventors:
ZHENG ZHENYU (CN)
XIE ZHENNAN (CN)
JIANG YONG (CN)
XIE ZHENNAN (CN)
JIANG YONG (CN)
Application Number:
PCT/CN2020/089797
Publication Date:
December 10, 2020
Filing Date:
June 05, 2020
Export Citation:
Assignee:
ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA (CN)
International Classes:
C23C16/46
Domestic Patent References:
| WO2018069387A1 | 2018-04-19 |
Foreign References:
| CN108728828A | 2018-11-02 | |||
| CN101772837A | 2010-07-07 | |||
| CN103526183A | 2014-01-22 | |||
| FR2616808A1 | 1988-12-23 | |||
| JPH11191535A | 1999-07-13 |
Attorney, Agent or Firm:
SUNSHINEIP INTELLECTUAL PROPERTY LAW FIRM (CN)
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