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Title:
HIGH-PURITY PARASTYRENE SULFONIC ACID (SALT); POLYSTYRENE SULFONIC ACID (SALT) USING SAME; DISPERSANT, CONDUCTIVE POLYMER DOPANT, AQUEOUS NANOCARBON MATERIAL DISPERSION AND AQUEOUS CONDUCTIVE POLYMER DISPERSION EACH USING POLYSTYRENE SULFONIC ACID (SALT); AND METHOD FOR PRODUCING POLYSTYRENE SULFONIC ACID (SALT)
Document Type and Number:
WIPO Patent Application WO/2013/073259
Kind Code:
A1
Abstract:
Provided is a novel polystyrene sulfonic acid (salt) which is useful as a dispersant for producing an aqueous dispersion of a nanocarbon material such as a carbon nanotube, graphene or fullerene or an aqueous dispersion of a conductive polymer such as a polythiophene, polypyrrole, polyaniline, polyphenylene vinylene or polyphenylene. A structure-controlled polystyrene sulfonic acid (salt) which is obtained using a high-purity parastyrene sulfonic acid (salt) that contains less impurities such as isomers; a dispersant which contains the polystyrene sulfonic acid (salt) as an active ingredient; an aqueous dispersion of a nanocarbon material or a conductive polymer, which is obtained using the dispersant; and a method for producing the polystyrene sulfonic acid (salt).

Inventors:
OZOE SHINJI (JP)
YAMANOI KENICHI (JP)
MATSUNAGA HIDEAKI (JP)
Application Number:
PCT/JP2012/072119
Publication Date:
May 23, 2013
Filing Date:
August 31, 2012
Export Citation:
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Assignee:
TOSOH ORGANIC CHEMICAL CO LTD (JP)
OZOE SHINJI (JP)
YAMANOI KENICHI (JP)
MATSUNAGA HIDEAKI (JP)
International Classes:
C08F12/30; C01B31/02; C08F4/00; C08F297/00; C08K3/04; C08L25/18; C09D7/45; C09D17/00
Foreign References:
JPH03168239A1991-07-22
JP2009539453A2009-11-19
JP2010062059A2010-03-18
JP2011213823A2011-10-27
JPH10139816A1998-05-26
JP2005263608A2005-09-29
JP2010254546A2010-11-11
JP2006525220A2006-11-09
JP2004059666A2004-02-26
Attorney, Agent or Firm:
SHIRAI, Shigetaka (JP)
Shigetaka Shirai (JP)
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Claims: