Title:
HIGHLY ABSORBING LAYER SYSTEM, METHOD FOR PRODUCING THE LAYER SYSTEM AND SUITABLE SPUTTERING TARGET THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/063953
Kind Code:
A3
Abstract:
The invention relates to a light absorbing layer system consisting of at least two layers, one of which is an anti-reflective layer which faces an observer and which is made from a dielectric material, and at least one other layer is an absorbing layer facing away from the observer and is made from an oxide or from an oxynitride having a sub-stoichiometric oxygen content. Said layer system has a wavelength range of between 380 - 780nm including a visual transmission Tv of less than 1% and a visual reflection Rv of less than 6% and is characterised by a kappa absorption index of at least 0.70 with a wavelength of 550 mn.
Inventors:
SCHLOTT MARTIN (DE)
KASTNER ALBERT (DE)
SCHULTHEIS MARKUS (DE)
WAGNER JENS (DE)
SCHNEIDER-BETZ SABINE (DE)
DEWALD WILMA (DE)
SZYSZKA BERND (DE)
SITTINGER VOLKER (DE)
KASTNER ALBERT (DE)
SCHULTHEIS MARKUS (DE)
WAGNER JENS (DE)
SCHNEIDER-BETZ SABINE (DE)
DEWALD WILMA (DE)
SZYSZKA BERND (DE)
SITTINGER VOLKER (DE)
Application Number:
PCT/EP2013/071488
Publication Date:
July 03, 2014
Filing Date:
October 15, 2013
Export Citation:
Assignee:
HERAEUS MATERIALS TECH GMBH (DE)
FRAUNHOFER GES FORSCHUNG (DE)
FRAUNHOFER GES FORSCHUNG (DE)
International Classes:
G02B5/22; G02B1/11
Domestic Patent References:
| WO1997027997A1 | 1997-08-07 |
Foreign References:
| EP2336811A1 | 2011-06-22 | |||
| DE102009038000A1 | 2011-03-03 | |||
| EP2437085A1 | 2012-04-04 | |||
| EP2116631A1 | 2009-11-11 | |||
| US20040115362A1 | 2004-06-17 | |||
| EP0852266A1 | 1998-07-08 |
Attorney, Agent or Firm:
STAUDT, Armin (Hanau, DE)
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