Title:
HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL, AND HOLLOW CYLINDRICAL SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2016/140021
Kind Code:
A1
Abstract:
The hollow cylindrical ceramic target material according to the present embodiment has a surface roughness Ra of 1.2 μm or less on the inner-peripheral surface.
Inventors:
ISHIDA SHINTARO (JP)
Application Number:
PCT/JP2016/053743
Publication Date:
September 09, 2016
Filing Date:
February 09, 2016
Export Citation:
Assignee:
MITSUI MINING & SMELTING CO (JP)
International Classes:
C23C14/34; C04B37/02
Foreign References:
| JP2002030431A | 2002-01-31 | |||
| JP2013147368A | 2013-08-01 | |||
| JP2015132013A | 2015-07-23 | |||
| US20110220489A1 | 2011-09-15 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
Patent business corporation Sakai international patent firm (JP)
Patent business corporation Sakai international patent firm (JP)
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