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Title:
INNER WALL AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/039337
Kind Code:
A1
Abstract:
Disclosed is a cylindrical inner wall, which is to be used in a substrate treatment device, and which surrounds a placing table by having a gap between the outer periphery of the placing table and the inner wall, said placing table having a substrate placed thereon. In the inner wall, a plurality of slits are formed at the lower end, and a plurality of grooves are formed in the inner surface of the inner wall, said grooves extending from the upper end to the lower end of the inner wall, and being in communication with the slits.

Inventors:
ASAKAWA YUJI (JP)
TANAKA ATSUSHI (JP)
OGAWA HIROYUKI (JP)
Application Number:
PCT/JP2018/030184
Publication Date:
February 28, 2019
Filing Date:
August 13, 2018
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/302; H01L21/304
Foreign References:
JP2016127260A2016-07-11
JP2016029700A2016-03-03
JP2011249470A2011-12-08
JPH06112140A1994-04-22
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
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