Title:
ION TRAPPING DEVICE WITH INSULATING LAYER EXPOSURE PREVENTION AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2016/068648
Kind Code:
A1
Abstract:
One embodiment of the present invention provides an ion trapping device and a method for manufacturing same, the ion trapping device comprising: at least one central DC electrode including a DC connection pad provided on a semiconductor substrate, and a DC rail connected to the DC connection pad; an RF electrode including at least one RF rail which is located adjacent to the DC rail, and an RF pad connected to the at least one RF rail; at least one lateral electrode including at least one lateral electrode pad which is positioned on the opposite side of the DC electrode, with the RF electrode at the center; and an insulating layer for supporting at least one of the electrodes from the electrodes on top of the semiconductor substrate, wherein the insulating layer includes a first insulation layer and a second insulation layer positioned above the first insulation layer, and wherein the second insulation layer has an overhang which protrudes beyond the first insulation layer in the widthwise direction.
Inventors:
KIM TAEHYUN (KR)
CHO DONGIL (KR)
HONG SEOKJUN (KR)
LEE MINJAE (KR)
CHEON HONGJIN (KR)
CHO DONGIL (KR)
HONG SEOKJUN (KR)
LEE MINJAE (KR)
CHEON HONGJIN (KR)
Application Number:
PCT/KR2015/011581
Publication Date:
May 06, 2016
Filing Date:
October 30, 2015
Export Citation:
Assignee:
SK TELECOM CO LTD (KR)
UNIV SEOUL NAT R & DB FOUND (KR)
UNIV SEOUL NAT R & DB FOUND (KR)
International Classes:
G06N99/00
Foreign References:
| US7928375B1 | 2011-04-19 | |||
| US20100084549A1 | 2010-04-08 | |||
| US20050061767A1 | 2005-03-24 | |||
| US20060169882A1 | 2006-08-03 | |||
| KR20000043880A | 2000-07-15 |
Attorney, Agent or Firm:
LEE, CHULHEE (KR)
이철희 (KR)
이철희 (KR)
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