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Title:
KIT, UNDERLAYER FILM FORMING COMPOSITION FOR IMPRINTING, LAMINATE, AND PRODUCTION METHOD USING THESE
Document Type and Number:
WIPO Patent Application WO/2019/156008
Kind Code:
A1
Abstract:
A kit having: a curable composition for imprinting, that includes a polymerizable compound having an aromatic ring; and an underlayer film forming composition for imprinting, that includes a polymer and a solvent. The polymer includes at least one type of a specific constituent unit and has a polymerizable group. A film formed from the underlayer film forming composition for imprinting is solid at 23°C and is a continuous partial structure that includes the aromatic ring of the polymerizable compound. A section that occupies at least 60% by mass of the polymerizable compound is common with a continuous partial structure including an aromatic ring included in a substituent R in a side chain in the polymer. The present invention also pertains to: an underlayer film forming composition for imprinting that is used together with the curable composition for imprinting; a laminate; a laminate production method; a cured product pattern production method; and a circuit board production method.

Inventors:
SHIMOJU Naoya (4000 Kawashiri Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
SHIBUYA Akinori (4000 Kawashiri Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
GOTO Yuichiro (4000 Kawashiri Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
HAKAMATA Akihiro (4000 Kawashiri Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2019/003767
Publication Date:
August 15, 2019
Filing Date:
February 04, 2019
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
C09D133/04; B29C59/02; B32B27/30; C08F20/18; C08F212/08; C08F290/12; C09D5/00; C09D125/02; C09D129/10; C09D145/00; C09D165/00; H01L21/027
Domestic Patent References:
WO2017170631A12017-10-05
WO2017170697A12017-10-05
WO2016152600A12016-09-29
WO2014097993A12014-06-26
Foreign References:
JP2014189616A2014-10-06
JP2017199787A2017-11-02
JP2016058663A2016-04-21
Attorney, Agent or Firm:
SIKS & CO. (8th Floor, Kyobashi-Nisshoku Bldg. 8-7, Kyobashi 1-chome, Chuo-k, Tokyo 31, 〒1040031, JP)
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