Title:
LASER ANNEALING APPARATUS, LASER ANNEALING METHOD, AND MASK
Document Type and Number:
WIPO Patent Application WO/2018/109912
Kind Code:
A1
Abstract:
Provided are a laser annealing apparatus, a laser annealing method, and a mask with which scan nonuniformity can be decreased. According to the present invention, all or some openings of a plurality of openings are configured so that a partial subregion of a prescribed region is irradiated with laser light. The plurality of openings are configured so that, between prescribed regions irradiated with laser light via a group of openings in one row arranged in a row direction and prescribed regions irradiated with laser light via a group of openings in another row arranged in the row direction, the number of laser light radiations in subregions having the same occupying region is the same, and at least two openings of a group of openings arranged in a column direction have different positions or shapes.
Inventors:
MATSUSHIMA YOSHIAKI (JP)
UNO TAKESHI (JP)
SUGAWARA YUTA (JP)
IMANISHI KOTA (JP)
NODERA NOBUTAKE (JP)
MATSUMOTO TAKAO (JP)
UNO TAKESHI (JP)
SUGAWARA YUTA (JP)
IMANISHI KOTA (JP)
NODERA NOBUTAKE (JP)
MATSUMOTO TAKAO (JP)
Application Number:
PCT/JP2016/087432
Publication Date:
June 21, 2018
Filing Date:
December 15, 2016
Export Citation:
Assignee:
SAKAI DISPLAY PRODUCTS CORP (JP)
International Classes:
H01L21/20
Domestic Patent References:
| WO2016186043A1 | 2016-11-24 |
Foreign References:
| JP2002324759A | 2002-11-08 | |||
| JP2005536874A | 2005-12-02 | |||
| JP2007096244A | 2007-04-12 | |||
| JP2009289922A | 2009-12-10 | |||
| JP2011233597A | 2011-11-17 |
Attorney, Agent or Firm:
KOHNO, Hideto et al. (JP)
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