LASER-EXCITED PLASMA LIGHT SOURCE, EXPOSURE APPARATUS AND ITS MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD

Title:

LASER-EXCITED PLASMA LIGHT SOURCE, EXPOSURE APPARATUS AND ITS MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/1999/063790

Kind Code:

A1

Abstract:

The end of a nozzle (23) of a laser-excited plasma light source is made of a specific material, such as silicon Si, the transmittance of which to EUV light is higher than those of heavy metals. Therefore, even if the temperature of the end of the nozzle (23) is higher than the melting point of the specific material because of the high temperature of the plasma produced around the focal point (24), the end of the nozzle is therefore eroded, and sputtered particles of the material adhere to a light-collecting mirror provided near the nozzle, the degradation of the reflectance of the light-collecting mirror (PRM) is mitigated compared to the case where a conventional heavy metal nozzle is used because the transmittance of the sputtered particles (specific material) to EUV light is higher than those of heavy metals.

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Inventors:

OTA KAZUYA (JP)
TANIMOTO AKIKAZU (JP)
KONDO HIROYUKI (JP)
KANDAKA NORIAKI (JP)

Application Number:

PCT/JP1999/002878

Publication Date:

December 09, 1999

Filing Date:

May 31, 1999

Export Citation:

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Assignee:

NIKON CORP (JP)
OTA KAZUYA (JP)
TANIMOTO AKIKAZU (JP)
KONDO HIROYUKI (JP)
KANDAKA NORIAKI (JP)

International Classes:

G03F7/20; (IPC1-7): H05H1/24; G21K5/00; H05G1/00; H01J35/22; G03F7/20; H01L21/027

Foreign References:

JPH10221499A	1998-08-21
JPH10208988A	1998-08-07
JPH1031099A	1998-02-03
JPH0817371A	1996-01-19

Other References: