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Patent Searching and Data


Title:
LASER PROCESSING APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2012/147200
Kind Code:
A1
Abstract:
Provided are a laser processing apparatus and method capable of preventing conversion efficiency deterioration caused by integration of a tandem thin-film silicon solar cell. The laser processing apparatus of the present invention performs a dividing process by casting a laser beam (602) generated by a laser source and a control system (601) onto thin films stacked on a substrate (609) so as to form a scribe ditch (610) and thus to divide thin films. The apparatus comprises a beam shape controlling optical system (603) so that a cross section of the laser beam (602) cast onto the thin films can have a portion protruding forward in the direction of the dividing process.

Inventors:
MORITA DAIJI (JP)
ECHIZENYA DAISUKE (JP)
OKAMOTO TATSUKI (JP)
YURA SHINSUKE (JP)
KATSURA TOMOTAKA (JP)
NAKAMURA REONA (JP)
Application Number:
PCT/JP2011/060432
Publication Date:
November 01, 2012
Filing Date:
April 28, 2011
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
MORITA DAIJI (JP)
ECHIZENYA DAISUKE (JP)
OKAMOTO TATSUKI (JP)
YURA SHINSUKE (JP)
KATSURA TOMOTAKA (JP)
NAKAMURA REONA (JP)
International Classes:
H01L31/04; B23K26/073; B23K26/40
Domestic Patent References:
WO2011027533A12011-03-10
Foreign References:
JP2004306082A2004-11-04
JP2007184421A2007-07-19
JP2002043605A2002-02-08
JP2002033495A2002-01-31
Attorney, Agent or Firm:
SAKAI, HIROAKI (JP)
Hiroaki Sakai (JP)
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Claims: