LIFTING MECHANISM, LIFTING PLATFORM DEVICE, LITHOGRAPHY MACHINE AND LITHOGRAPHY METHOD

WIPO Patent Application WO/2019/137496

A1

Disclosed is a lifting mechanism, a lifting platform device, a lithography machine, and a lithography method. The lifting mechanism comprises a case (4), a worm (1), a worm wheel (2), and a lead screw (3), wherein when rotating, the worm (1) drives the worm wheel (2) to rotate, and the lead screw (3) is driven, by means of the rotation of the worm wheel (2), to move up and down in the vertical direction. The lifting mechanism can simultaneously meet the requirements of highly precise and large-load vertical lifting adjustment in a limited space, and uses an anti-rotation limiting mechanism to prevent the lead screw (3) from rotating such that the output power of the worm wheel (2) and the worm (1) is completely received by the lead screw (3), and the range of motion of the lead screw (3) is also limited, so that the entire transmission mechanism is more efficient and reliable. The lifting mechanism compensates for the lack of high-precision, large-load and small-sized lifting mechanisms in the prior art, and is applied to, for example, the field of lithography machines, and the lithography effect thereof can also be correspondingly improved.

GUAN BORAN (CN)
HUANG YAQING (CN)
CONG GUODONG (CN)

PCT/CN2019/071446

July 18, 2019

January 11, 2019

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SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)

B23K26/10; B66F3/18; F16H55/24

CN201694783U	2011-01-05
CN203756942U	2014-08-06
CN202007097U	2011-10-12
CN101086201A	2007-12-12
CN201760706U	2011-03-16
CN203667951U	2014-06-25
US20080073630A1	2008-03-27

SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)

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